Dataset for "‘Double’ Displacement Talbot Lithography: fast, wafer-scale, direct-writing of complex periodic nanopatterns"

This study developed a new low-cost nanolithographic tool for creating periodic arrays of complex, nano-motifs, across large areas within minutes. Displacement Talbot Lithography is combined with lateral nanopositioning to enable large-area patterning with the flexibility of a direct-write system. This enables the creation of different periodic patterns in short timescales using a single mask with no mask degradation. The dataset includes images of Matlab models (in .csv format) and SEM experimental pictures of the different experiments realised (discrete lateral illumination, continuous displacements during one illumination).Secondary electron images were captured using a Hitachi S-4300 scanning electron microscope (SEM). An accelerating voltage of 5 kV was used to collect the images. The modelling has been performed by a code in MATLAB